Runway is an generative AI platform that simplifies the integration of artificial intelligence into creative workflows for artists and designers. The company’s platform offers a user-friendly interface, diverse AI models, and customization capabilities to empower users to explore new possibilities and unlock the potential of AI in their video work. Runway was founded in 2018 by Alejandro Matamala, Anastasis Germanidis, and Cristóbal Valenzuela Barrera.